ZnO/Al2O3 layered structures deposited by RF magnetron sputtering on glass: growth characteristics, optical properties, and microstructural analysis
Künye
Tüzemen, E. Ş., Özer, A., Demir, İ., Altuntaş, İ., & Şimşir, M. (2021). ZnO/Al2O3 layered structures deposited by RF magnetron sputtering on glass: growth characteristics, optical properties, and microstructural analysis. Journal of the Australian Ceramic Society, 57(5), 1379-1388.Özet
In this study, Al2O3 thin films of different thicknesses (50 nm, 100 nm, 150 nm, 200 nm, and 250 nm) were, first, grown using RF
magnetron sputtering technique on glass substrate at 30 °C temperature, with 120Wpower value. Then 250 nm ZnO was grown
on these thin films. Microstructural analyses of the thin films were made by scanning electron microscope (SEM). It was
observed that the particle size changed with increasing thickness of Al2O3 thin films. ZnO layer was grown onto alumina grown
tubes with an approximate thickness of 250 nm. The grain morphology of ZnO was similar to alumina, about 25–30 nm grain
size. Energy-dispersive X-ray analysis (EDX) detector was used to determine the chemical composition of the samples. These
results have indicated that ZnO thin films are successfully formed on alumina tubes. Crystal structure analyses of all samples
were examined using the X-ray diffraction (XRD) technique. In addition, the optical properties of the samples were examined
with ultraviolet-visible-near infrared spectrometer (UV-VIS-NIR). This work provides valuable references for the application of
Al2O3 as insulating buffer layers.