Effect of substrate temperature on Raman study and optical properties of GeOx/ Si thin films

Baghdedi, Dhouha; Hopoğlu, Hicret; Demir, İlkay; Altuntaş, İsmail; Abdelmoula, Najmeddine; Şenadım, Tüzemen Ebru

Effect of substrate temperature on Raman study and optical properties of GeOx/ Si thin films

dc.contributor.author	Baghdedi, Dhouha
dc.contributor.author	Hopoğlu, Hicret
dc.contributor.author	Demir, İlkay
dc.contributor.author	Altuntaş, İsmail
dc.contributor.author	Abdelmoula, Najmeddine
dc.contributor.author	Şenadım, Tüzemen Ebru
dc.date.accessioned	2024-03-05T10:16:48Z
dc.date.available	2024-03-05T10:16:48Z
dc.date.issued	14.10.2023	tr
dc.department	Eğitim Bilimleri Enstitüsü	tr
dc.description.abstract	In this study, GeOx thin films were deposited onto Si substrates using the RF magnetron sputtering method. We looked at how the temperature of the substrate affected the Raman spectra and optical characteristics of GeOx thin films. X-ray diffraction was utilized to examine the crystal structure, and a scanning electron microscope was utilized to measure the thickness. In order to investigate the local structure and bonding characteristics, Raman spectroscopy was used. The refractive index, extinction coefficient, and dielectric parameters were calculated using spectroscopic ellipsometry for the 300–1100 nm spectral region. Refractive index and extinction coefficient spectral patterns were discovered by using a sample-air optical model to analyze the experimental ellipsometric data. Notably, a considerable rise in the refractive index was accompanied by a rise in substrate temperature.	tr
dc.identifier.uri	https://hdl.handle.net/20.500.12418/14671
dc.language.iso	en	en_US
dc.relation.publicationcategory	Rapor	tr
dc.rights	info:eu-repo/semantics/openAccess	tr
dc.subject	GeOx · Raman spectrometry · RF · Optical study · Structural study	tr
dc.title	Effect of substrate temperature on Raman study and optical properties of GeOx/ Si thin films	en_US
dc.type	Article	en_US