Browsing by Publisher "NATL INST OPTOELECTRONICS"
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Effects of Al concentration on photovoltaic property of ZnO:Al/p-type Si by pulsed filtered cathodic vacuum arc depositio ri system
(NATL INST OPTOELECTRONICS, 2015)The effects of Al concentration on XPS, Raman, Hall and photovoltaic properties of Al-doped ZnO films were investigated onto Si (100) substrate by pulsed filtered cathodic vacuum arc deposition (PFCVAD) system, at room ... -
Modeling of reflectance properties of ZnO film using artificial neural networks
(NATL INST OPTOELECTRONICS, 2015)A ZnO thin film was prepared on a p-Si (100) substrate by using a pulsed filtered cathodic vacuum arc deposition system (PFCVAD). Specular reflectance, a nondestructive technique, can be used to measure thickness, refractive ...