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dc.contributor.authorHopoglu, H
dc.contributor.authorAydınoglu, H.S.
dc.contributor.authorOzer, A.
dc.contributor.authorSenadım Tüzemen, E.
dc.date.accessioned2022-05-13T11:35:15Z
dc.date.available2022-05-13T11:35:15Z
dc.date.issued(2021)tr
dc.identifier.citationH. Hopoğlu, H.S. Aydınoğlu, A. Özer, E. Şenadım Tüzemen, Investigation of nitrogen doped ZnO thin films: Effects on their structural and optical properties, Optical Materials, Volume 122, Part A, 2021, 111685, ISSN 0925-3467,tr
dc.identifier.urihttps://www.sciencedirect.com/science/article/abs/pii/S0925346721008855?via%3Dihub
dc.identifier.urihttps://hdl.handle.net/20.500.12418/13056
dc.description.abstractUn-doped and nitrogen-doped ZnO thin films were grown by using radio frequency (RF) magnetron sputtering method changing the nitrogen flow rate between 0% ����� 12.5% and the thickness dependence of films was determined. The effect of nitrogen doping concentration on the structural, morphological, and optical properties of zinc oxide thin films was studied. X-ray diffraction (XRD) analysis confirmed that the nitrogen-doped ZnO films belong to the hexagonal crystal structure. The optical properties of the grown samples were examined by optical spectrophotometer and spectroscopic ellipsometer. Transmittance spectra were obtained by spectrophotometer measurements and the effect of nitrogen ratio was investigated. It has been observed that as the nitrogen ratio increases, the transmittance decreases up to ~500 nm and then increases. By using the transmittance curve, the energy band gap was calculated. Further detailed optical analysis was made by the spectroscopic ellipsometry technique. Fitting was performed to ensure the agreement between the experimentally obtained Ψ values and theoretically determined Ψ values using the Cauchy model. As a result, the refractive index was found for each film and it was observed that the refractive index decreased as the nitrogen ratio increased. The scanning electron microscopy (SEM) measurements showed that the surface morphology of the films changes with N doping. Nitrogen was observed in Fourier transform infrared spectra analysis. 5% nitrogendoped ZnO films were grown on the glass substrate using RF magnetron sputtering at room temperature. Samples are prepared by varying thicknesses during the deposition process. XRD and SEM measurements of the samples show the variation in the crystal structure and surface morphology of the film with varying thicknesses. All the samples are tested for the transmittance and band gap. The increase of film thickness increases the grain size. The transmittance is influenced by the film thickness.tr
dc.language.isoengtr
dc.publisherElseviertr
dc.relation.isversionof10.1016/j.optmat.2021.111685tr
dc.rightsinfo:eu-repo/semantics/openAccesstr
dc.subjectN doped ZnOtr
dc.subjectMagnetron sputteringtr
dc.subjectSpectroscopic Ellipsometertr
dc.subjectXRDtr
dc.subjectEnergy band gaptr
dc.titleInvestigation of nitrogen doped ZnO thin films: Effects on their structural and optical propertiestr
dc.typearticletr
dc.relation.journalOptical Materialstr
dc.contributor.departmentMühendislik Fakültesitr
dc.contributor.authorID0000-0002-4207-8207tr
dc.identifier.volume122tr
dc.identifier.issue111685tr
dc.identifier.endpage11tr
dc.identifier.startpage1tr
dc.relation.publicationcategoryUluslararası Hakemli Dergide Makale - Kurum Öğretim Elemanıtr


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