Close oxygen coupled low-pressure chemical vapor deposition growth of high quality ? - Ga2O3 on sapphire
dc.authorid | AKYOL, FATIH/0000-0003-4277-4234 | |
dc.contributor.author | Akyol, Fatih | |
dc.contributor.author | Demir, Ilkay | |
dc.date.accessioned | 2024-10-26T18:05:49Z | |
dc.date.available | 2024-10-26T18:05:49Z | |
dc.date.issued | 2022 | |
dc.department | Sivas Cumhuriyet Üniversitesi | |
dc.description.abstract | We report on the close oxygen coupled low-pressure chemical vapor deposition (COC-LPCVD) hetero-epitaxial growth of atomically smooth (-201) oriented beta-Ga2O3 on c-plane sapphire. Utilizing a dedicated line within the main tube, O-2 could be delivered to the substrate surface which enables effective control of growth regime. Under optimized conditions (Ga-rich and near stoichiometric feed rate), step flow growth was obtained with X-ray rocking curve full-width at half maximum of 0.09 degrees and 0.20 degrees at a growth rate of 0.49 mu m/h and 3.42 mu m/h, respectively. On the other hand, oxygen-rich growth at high growth rates produced in-plane rotational domains. In addition, the alignment of single crystal (-201) beta-Ga2O3 with respect to the sapphire offcut direction was revealed such that [-20-1] beta-Ga2O3 is along [11-20] (offcut direction) sapphire. This study demonstrates the potential of the versatile COC-LPCVD system on the thin film growth of high quality beta-Ga2O3. | |
dc.identifier.doi | 10.1016/j.mssp.2022.106645 | |
dc.identifier.issn | 1369-8001 | |
dc.identifier.issn | 1873-4081 | |
dc.identifier.scopus | 2-s2.0-85126990463 | |
dc.identifier.scopusquality | Q1 | |
dc.identifier.uri | https://doi.org/10.1016/j.mssp.2022.106645 | |
dc.identifier.uri | https://hdl.handle.net/20.500.12418/29193 | |
dc.identifier.volume | 146 | |
dc.identifier.wos | WOS:000791698100004 | |
dc.identifier.wosquality | Q2 | |
dc.indekslendigikaynak | Web of Science | |
dc.indekslendigikaynak | Scopus | |
dc.language.iso | en | |
dc.publisher | Elsevier Sci Ltd | |
dc.relation.ispartof | Materials Science in Semiconductor Processing | |
dc.relation.publicationcategory | Makale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanı | |
dc.rights | info:eu-repo/semantics/closedAccess | |
dc.title | Close oxygen coupled low-pressure chemical vapor deposition growth of high quality ? - Ga2O3 on sapphire | |
dc.type | Article |