Comprehensive growth and characterization study of GeOx/Si

dc.contributor.authorBaghdedi, Dhouha
dc.contributor.authorHopoğlu, Hicret
dc.contributor.authorSarıtaş, Sevda
dc.contributor.authorDemir İlkay
dc.contributor.authorAltuntaş İsmail
dc.contributor.authorAbdelmoula, Najmeddine
dc.contributor.authorGür, Emre
dc.contributor.authorŞenadımTüzemen, Ebru
dc.date.accessioned2024-02-29T06:27:57Z
dc.date.available2024-02-29T06:27:57Z
dc.date.issued2023tr
dc.departmentFen Fakültesitr
dc.description.abstractIn this study, the reactive radio frequency magnetron sputtering (RFMS) method under varying thickness was used to deposit GeO x on Si substrate at room temperature. The effect of thickness on the structural and optical properties of high-quality germanium dioxide ( GeO 2 ) thin films have been investigated by experimental. Structural properties were investigated using X-ray diffraction. It has been observed that the peak intensity of (113) reflection is the highest in the spectrum of 240.22 nm thickness and using scanning electron microscope (SEM) to calculate thickness of different samples. Reflection measurement, which is one of its optical properties, was measured with an optical spectrophotometer. It has been ob- served that as the thickness increases, the total reflectance changes. The absorption coefficient was calcu- lated using the diffuse reflection curve. From this point of view, the energy band gap was calculated and it was seen that it varies between 4.1 eV and 4.4 eV. As a result, it was observed that the energy band gap increased as the thickness increased. And using spectroscopic ellipsometry to calculate the thickness of different, refractive index, extinction coefficient, and oscillator parameters. The oscillator energy decrease as the thickness of films increases and the dispersion energy increase with the increase of thickness. It have been observed that the thickness varies between 174.29 nm and 332.16 nm. The refractive index increases as the thickness increases.tr
dc.identifier.doi10.1016/j.molstruc.2022.134398en_US
dc.identifier.endpage8tr
dc.identifier.scopus2-s2.0-85140579926en_US
dc.identifier.scopusqualityN/A
dc.identifier.startpage1tr
dc.identifier.urihttps://hdl.handle.net/20.500.12418/14446
dc.identifier.volume1274tr
dc.identifier.wosWOS:000904798600002en_US
dc.identifier.wosqualityQ2
dc.indekslendigikaynakWeb of Scienceen_US
dc.indekslendigikaynakScopusen_US
dc.language.isoenen_US
dc.publisherELSEVIERtr
dc.relation.ispartofJournal of Molecular Structureen_US
dc.relation.publicationcategoryUluslararası Hakemli Dergide Makale - Kurum Öğretim Elemanıtr
dc.rightsinfo:eu-repo/semantics/closedAccesstr
dc.subjectGeOxtr
dc.subjectMagnetron sputteringtr
dc.subjectOptical propertiestr
dc.subjectStructural propertiestr
dc.titleComprehensive growth and characterization study of GeOx/Sien_US
dc.typeArticleen_US

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